AVS 47th International Symposium
    Magnetic Interfaces and Nanostructures Thursday Sessions
       Session MI+NS+NANO 6-ThM

Paper MI+NS+NANO 6-ThM10
Patterning of Co/Pt Multilayers: Topological vs. Magnetic

Thursday, October 5, 2000, 11:20 am, Room 206

Session: Nanomagnetism
Presenter: V. Metlushko, Argonne National Laboratory
Authors: V. Metlushko, Argonne National Laboratory
G. Crabtree, Argonne National Laboratory
V. Vlasko-Vlasov, Argonne National Laboratory
P. Baldo, Argonne National Laboratory
L. Rehn, Argonne National Laboratory
M. Kirk, Argonne National Laboratory
B. Ilic, Cornell University
S. Zhang, University of New Mexico
S.R.J. Brueck, University of New Mexico
B.D. Terris, IBM Almaden Research Center
Correspondent: Click to Email
Using magnetron sputtering for Pt and e-beam deposition for Co the [Co4/Pt10]n multilayers were prepared on a Si/SiO2 substrate. The patterning of submicron periodic arrays were done in two ways, using traditional interference- or e-beam lithography and lift-off which modulates the material composition of the film, and using 30 keV He ion irradiation through a mask which leaves the chemical composition and topography unchanged but reduces the magnetic anisotropy. The results of systematic characterization of arrays for different doses ranging from 1e15 to 5e16 ions/cm2 with SQUID magnetization to determine the magnetic anisotropy and moment size, with atomic force microscopy (AFM) and magnetic force microscopy (MFM) to determine the topography and the magnetic order in the periodic arrays, and with magneto optical imaging to visualize the moment reversal process during a magnetization cycle will be presented. @FootnoteText@ This work was supported by the U.S. DOE, BES-Materials Sciences, under contract W-31- 109-ENG-38 (V.M., G.C.) and by DARPA (S.Z., S.R.J.B.).